Elham Mohagheghpour, Marjan Rajabi, Reza Gholamipour, Majid M. Larijani, Shahab Sheibani
Journal of Materials research 14 March 2017, pp. 1367-1375
2017
The amorphous carbon thin films were deposited by the ion beam sputtering deposition technique on Ni–Cu alloy substrates. The effect of sputtering ion beam energy on wettabillity, surface, and structural properties of thin films was examined. The sputtering ion beam energy was varied over a wide range from 2 to 5 keV. Raman spectra showed that the values of I D/I G ratio and the ‘G’ peak position have a reduction trend by increasing the argon ion beam energy while the surface roughness increased due to the resputtering effect. The wettability and surface energy of a-C carbon films were studied by contact angle measurements in relation to structure and topography. The deposited films showed a relatively high water contact angle (CA) that decreases from 87° to 75°. The X-ray photoelectron spectroscopy showed that the value of sp 3/sp 2bond content of a-C thin films deposited with the highest argon ion beam energy of 5 keV was about 0.8. Furthermore, the optical band gap followed similar trends of the structural properties.